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Thermal etching of silicon carbide crystals in a plasma torch.
Author(s):
1. Salahuddin: Pakistan Science Foudation (PSF), Islamabad, Pakistan
Abstract:
Thermal treatment of silicon carbide crystals in an inert atmosphere of a plasma torch, in the high temperature range 2000-3000°C was carried out. Evidence is provided that such a treatment can reveal dislocations. The treatment does not leave any reaction products and the surface of the crystal is left clean and shiny.
Page(s): 61-62
DOI: DOI not available
Published: Journal: Pakistan Journal of Scientific and Industrial Research, Volume: 29, Issue: 1, Year: 1986
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