Abstract:
Effect of weak magnetic field on the electro-deposition of nickel onto copper electrode has been investigated. The working conditions were optimized through adjustment of cathodic current density (CCD), deposition time, bath temperature and pH of the medium. For electro-deposition in the absence of magnetic field, the optimum conditions comprised of pH = 4.0 ± 0.5, average CCD = 22.5 ± 0.5 mA cm-2 and bath temperature in the range 25 to 30 oC. The same conditions were maintained for the electro-deposition while applying magnetic field of 0.75 kG. The morphological features of the Ni-deposits on copper cathode were compared for the two cases. The applied magnetic field not only enhanced the amount of nickel deposition but also improved the quality of the deposit. Surface morphology of the electro-deposited nickel has been monitored using scanning electron microscopy (SEM); the preliminary investigation has shown that the limiting current density (LCD) increases with the magnetic field. One possible explanation to this behavior is the convection flow of cations close to the electrode surface induced by the Lorentz force which also influences the ion-migration.
Page(s):
54-57
DOI:
DOI not available
Published:
Journal: Proceedings 5th International Bhurban Conference on Applied Sciences and Technology , Volume: 0, Issue: 0, Year: 2007